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About Nano-CMOS Circuit And Physical Design
Product Description Based on the authors' expansive collection of notes taken over the years, Nano-CMOS Circuit and Physical Design bridges the gap between physical and circuit design and fabrication processing, manufacturability, and yield. This innovative book covers: process technology, including sub-wavelength optical lithography; impact of process scaling on circuit and physical implementation and low power with leaky transistors; and DFM, yield, and the impact of physical implementation. From the Inside Flap A practical approach to nano-CMOS circuit design and implementation The fast pace of new technology and the challenges of nano-scaling are bringing together the once-separate disciplines of circuit design, technology device physics, and physical implementation. A good understanding of the underlying physical constraints of device, interconnect, and manufacturing is crucial for designing circuit systems and devices and making sound technology decisions. Nano-CMOS Circuit and Physical Design integrates the nanometer process, device manufacturability, advanced circuit design, and related physical implementation into a single, seamless approach to advanced semiconductor technology. This comprehensive volume explores new developments in devices and processing; presents design issues, paying special attention to technology/design interactions such as signal integrity and interconnects; and addresses the impact of design for manufacturability and variability. Important topics include: Nano-CMOS process scaling issues and implications on design Subwavelength optical lithography Physics and theory of operation issues and solutions Design for manufacturability and variability Written by expert practitioners, Nano-CMOS Circuit and Physical Design is a useful resource for IC designers and professionals in the field, providing them with practical design solutions and approaches. From the Back Cover A practical approach to nano-CMOS circuit design and implementation The fast pace of new technology and the challenges of nano-scaling are bringing together the once-separate disciplines of circuit design, technology device physics, and physical implementation. A good understanding of the underlying physical constraints of device, interconnect, and manufacturing is crucial for designing circuit systems and devices and making sound technology decisions. Nano-CMOS Circuit and Physical Design integrates the nanometer process, device manufacturability, advanced circuit design, and related physical implementation into a single, seamless approach to advanced semiconductor technology. This comprehensive volume explores new developments in devices and processing; presents design issues, paying special attention to technology/design interactions such as signal integrity and interconnects; and addresses the impact of design for manufacturability and variability. Important topics include: Nano-CMOS process scaling issues and implications on design Subwavelength optical lithography Physics and theory of operation issues and solutions Design for manufacturability and variability Written by expert practitioners, Nano-CMOS Circuit and Physical Design is a useful resource for IC designers and professionals in the field, providing them with practical design solutions and approaches. About the Author BAN P. WONG, IENG MIEE, served for five years as a member of the technical program committee of IEEE International Solid-State Circuits Conference and as session chair, cochair, and organizer of a panel session. He has three issued patents. He has led circuit design teams in developing methodology and implementation of high-performance and low-power microprocessors. He is currently Senior Engineering Manager for NVIDIA Corporation. ANURAG MITTAL received his PhD in applied physics from Yale University. He has codeveloped novel embedded NVM microcontroller and microprocessor solutions including the world’s first truly CMOS-compatible Flash
